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专利名称：Precursors for formation of copper selenide,
indium selenide, copper indium diselenide,and/or copper indium gallium diselenidefilms
发明人：Calvin J. Curtis,Alexander Miedaner,Maikel
Van Hest,David S. Ginley
申请号：US11813234申请日：20061109公开号：US08876971B2公开日：20141104
专利附图：
摘要：Liquid-based precursors for formation of Copper Selenide, Indium Selenide,Copper Indium Diselenide, and/or copper Indium Galium Diselenide include copper-organoselenides, particulate copper selenide suspensions, copper selenide ethylenediamine in liquid solvent, nanoparticulate indium selenide suspensions, and indiumselenide ethylene diamine coordination compounds in solvent. These liquid-basedprecursors can be deposited in liquid form onto substrates and treated by rapid thermalprocessing to form crystalline copper selenide and indium selenide films.
申请人：Calvin J. Curtis,Alexander Miedaner,Maikel Van Hest,David S. Ginley
地址：Lakewood CO US,Boulder CO US,Lakewood CO US,Evergreen CO US
国籍：US,US,US,US
代理人：John C. Stolpa,Michael A. McIntyre
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